DocumentCode
3328117
Title
Extended Interaction Klystrons for terahertz power amplifiers
Author
Chernin, D. ; Burke, Annette ; Chernyavskiy, I. ; Petillo, John ; Horoyski, A.R.P. ; Hyttinen, Mark ; Dobbs, Richard ; Berry, Dave ; Blank, Marita ; Nguyen, Khanh ; Jabotinsky, V. ; Wright, Edward ; Pershing, Dean ; Calame, Jeffrey ; Levush, Baruch ; Gaie
Author_Institution
Sci. Applic. Int. Corp., McLean, VA, USA
fYear
2010
fDate
20-24 June 2010
Firstpage
1
Lastpage
1
Abstract
Summary form only given. Extended Interaction Klystrons have been demonstrated at frequencies up to 218 GHz CW and 229 GHz pulsed. Modern design, fabrication, and measurement technologies show promise of extending their operation into the THz regime. This paper describes the challenges and some novel approaches to the development of EIKs operating terahertz frequencies, while simultaneously meeting demanding requirements for output power, gain, bandwidth, and efficiency.The main challenges in design include focus and transport of an emittance dominated beam, development of a broadband, high gain circuit, and the minimization of the sensitivity of design to the effects of fabrication and alignment tolerances. The main challenges in fabrication and integration include achieving required component dimensions and alignment within specified tolerances and achieving high quality surface finishes using materials with satisfactory mechanical and thermal properties.
Keywords
klystrons; microwave power amplifiers; design sensitivity; emittance dominated beam transport; extended interaction klystrons; fabrication effect; high gain circuit; high quality surface; mechanical property; terahertz power amplifier; thermal property; Bandwidth; Circuits; Fabrication; Frequency; Klystrons; Minimization; Power amplifiers; Power generation; Pulse amplifiers; Submillimeter wave technology;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2010 Abstracts IEEE International Conference on
Conference_Location
Norfolk, VA
ISSN
0730-9244
Print_ISBN
978-1-4244-5474-7
Electronic_ISBN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2010.5533941
Filename
5533941
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