DocumentCode
3328190
Title
Field emission from metal-particle bound with a photoresist
Author
Baba, Akiyoshi ; Asano, Takashi
Author_Institution
Center for Microelectron. Syst., Kyushu Inst. of Technol., Fukuoka, Japan
fYear
2001
fDate
2001
Firstpage
235
Lastpage
236
Abstract
Proposes a film composed of metal particles for use in field electron emitter material on a large substrate. Test films were prepared on a silicon substrate from a mixture of palladium fine particles and positive tone photoresist. It was found that the photoresist at the surface acted as a barrier for electron emission. It was also found that the emission current abruptly increases with time evolution applying a constant voltage. After this phenomenon, the threshold voltage for electron emission was drastically decreased and the emission current became stable
Keywords
cathodes; diodes; field emission displays; particle reinforced composites; photoresists; Pd; diode structure; emission current; field electron emitter material; field-emission displays; fine particles; metal particles; positive tone photoresist; threshold voltage; Electron emission; Electron guns; Inorganic materials; Palladium; Resists; Semiconductor films; Silicon; Substrates; Testing; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International
Conference_Location
Davis, CA
Print_ISBN
0-7803-7197-6
Type
conf
DOI
10.1109/IVMC.2001.939740
Filename
939740
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