• DocumentCode
    3333988
  • Title

    Robust parylene-to-silicon mechanical anchoring

  • Author

    Liger, Matthieu ; Rodger, Damien C. ; Tai, Yu-Chong

  • Author_Institution
    Dept. of Electr. Eng., California Inst. of Technol., Pasadena, CA, USA
  • fYear
    2003
  • fDate
    19-23 Jan. 2003
  • Firstpage
    602
  • Lastpage
    605
  • Abstract
    This paper describes a new technique for strongly anchoring parylene (poly-para-xylylene) layers on a silicon substrate. Parylene has gained interest for MEMS applications due to its excellent properties. More specifically, because of its flexibility (Young´s modulus of 4 GPa), its chemical barrier properties, its conformal deposition and its biocompatibility, parylene is of great interest for microfluidics and BioMEMS. One of the issues with parylene processing is adhesion and delamination problems, occurring during fabrication or during device operation. Here, we report a new technique for anchoring parylene films on silicon using DRIE-etched trenches and anchors. We demonstrate a new way to completely protect the adhesion of parylene even when exposed to aggressive chemicals.
  • Keywords
    Young´s modulus; adhesion; conformal coatings; delamination; microfluidics; micromachining; micromechanical devices; plasma materials processing; polymer films; sputter etching; surface chemistry; DRIE-etched anchors; DRIE-etched trenches; MEMS applications; Si; Young´s modulus; adhesion; aggressive chemicals exposure; bioMEMS; biocompatibility; chemical barrier properties; conformal deposition; delamination; device operation; flexibility; microfluidics; parylene layers; parylene processing; parylene-to-silicon mechanical anchoring; poly-para-xylylene; silicon substrate; Adhesives; Chemicals; Delamination; Fabrication; Microfluidics; Micromechanical devices; Protection; Robustness; Semiconductor films; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 2003. MEMS-03 Kyoto. IEEE The Sixteenth Annual International Conference on
  • ISSN
    1084-6999
  • Print_ISBN
    0-7803-7744-3
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2003.1189821
  • Filename
    1189821