• DocumentCode
    3342587
  • Title

    Nonlinear optical properties of SiO2 layers

  • Author

    Yang, G.M. ; Amjadi, H. ; Sessler, G.M.

  • Author_Institution
    Inst. for Electroacoustics, Tech. Hochschule Darmstadt, Germany
  • fYear
    1996
  • fDate
    25-30 Sep 1996
  • Firstpage
    478
  • Lastpage
    483
  • Abstract
    Nonlinear optical properties of SiO2 layers are very interesting for applications in integrated electro-optical devices. Previous experiments, mostly performed on multilayer structures, show that nonlinear optical effects exist in SiO2 layers after application of a high electric field. In the present experiment a single layer of SiO2 was prepared by thermal oxidation of a silicon substrate. A transparent electrode was deposited on the top of the layer. Electron-beam charging was used to generate the nonlinear optical effects. A reflection technique which utilizes the propagation of a polarized laser beam through the ac-biased sample was used for measuring the electro-optical coefficient: Due to the electro-optical effect in the investigated SiO2 layer, the plane of polarization of the beam, which is partially reflected at the Si-SiO2 interface, oscillates compared to the polarization of the input laser beam. The observed electro-optical coefficient r33 is approximately 1.5 pm/V at λ=780nm and is higher than previously measured coefficients in SiO2. The effect shows no decay at room temperature over a period of several days
  • Keywords
    electro-optical effects; nonlinear optics; optical films; silicon compounds; 780 nm; SiO2; SiO2 layer; electro-optical coefficient; electron beam charging; nonlinear optical properties; polarized laser beam reflection; thermal oxidation; Electrooptic devices; Integrated optics; Laser beams; Lasers and electrooptics; Nonhomogeneous media; Nonlinear optical devices; Nonlinear optics; Optical devices; Optical polarization; Oxidation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrets, 1996. (ISE 9), 9th International Symposium on
  • Conference_Location
    Shanghai
  • Print_ISBN
    0-7803-2695-4
  • Type

    conf

  • DOI
    10.1109/ISE.1996.578136
  • Filename
    578136