DocumentCode
3352735
Title
Progressive automation system for semiconductor manufacturing
Author
Iwata, Yoshio ; Shimoyashiro, Sadao ; Masui, Tonioyului
Author_Institution
Semicond. Dev. Centre, Hitachi Ltd., Yokohama, Japan
fYear
1995
fDate
17-19 Sep 1995
Firstpage
127
Lastpage
130
Abstract
A new semiconductor manufacturing line was set up and subsequently expanded to meet growing demand. The high yields and short turn-around time necessitated by the most recent technology requires current process equipment to operate at the limit of its capacity. Current factory automation systems must continually evolve to meet these new requirements. The semiconductor manufacturing line consists of several bays, such as those for photolithography and ion implantation. Hitachi has developed a progressive, flexible automation system that can be applied to manufacturing at the bay level. This system has two aims: to reduce operators´ working hours by fully automating fabrication and semi-automating the inspection of wafers and equipment, and to increase working intervals between required equipment maintenance. The automation system is realized using in-situ monitoring
Keywords
flexible manufacturing systems; integrated circuit manufacture; integrated circuit yield; ion implantation; maintenance engineering; photolithography; equipment maintenance intervals; factory automation systems; flexible automation system; in-situ monitoring; ion implantation; manufacturing line; photolithography; process equipment; semiconductor manufacturing; turn-around time; yields; Automatic control; Control systems; Fabrication; Inspection; Integrated circuit technology; Integrated circuit yield; Lithography; Manufacturing automation; Manufacturing processes; Semiconductor device manufacture;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 1995., IEEE/UCS/SEMI International Symposium on
Conference_Location
Austin, TX
Print_ISBN
0-7803-2928-7
Type
conf
DOI
10.1109/ISSM.1995.524374
Filename
524374
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