DocumentCode
3363093
Title
Effect of strain on magnetoresistance and magnetic properties of Co (tCo)/Ag nanostructures
Author
Rizal, C. ; Gyawali, P. ; Kshattry, I. ; Ueda, Y. ; Pokharel, R.K.
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of British Columbia, Vancouver, BC, Canada
fYear
2011
fDate
18-21 Oct. 2011
Firstpage
120
Lastpage
124
Abstract
A series of [Co (tCo) nm/Ag 1.5 nm]50 nanostructures was grown using pulse electrodeposition onto polyimide substrates. The magnetoresistance (MR) ratio was examined as the Co layer thickness changed. A strain was induced mechanically, and this resulted in magnetic anisotropy. Magnetization curves were recorded as the strain was changed. The measured degree of magnetic anisotropy best fits linearly with the increase of strain. The MR values for the nanostructure with the field perpendicular to the easy axis and the direction of current are found to be larger than those of the field parallel to the easy axis and the direction of current. A maximum MR ratio of 9.1 % was observed for the [Co 1.5 nm/Ag 1.5 nm]50 nanostructure. The nanostructures showed remarkable magnetic properties owing to the induced strain.
Keywords
cobalt; electrodeposition; ferromagnetic materials; magnetic thin films; magnetoresistance; metallic thin films; nanofabrication; nanomagnetics; nanostructured materials; perpendicular magnetic anisotropy; silver; Co-Ag; ferromagnetic nanostructured materials; magnetic fields; magnetic properties; magnetization curves; magnetoresistance; mechanical strain; perpendicular magnetic anisotropy; polyimide substrates; pulse electrodeposition; thin films; Anisotropic magnetoresistance; Copper; Perpendicular magnetic anisotropy; Thickness measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology Materials and Devices Conference (NMDC), 2011 IEEE
Conference_Location
Jeju
Print_ISBN
978-1-4577-2139-7
Type
conf
DOI
10.1109/NMDC.2011.6155324
Filename
6155324
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