Self-Formed High-Aspect-Ratio Polymer Nanopillars by RIE

Author

Chen, M.H. ; Hsu, T.H. ; Chuang, Y.-J. ; Chen, P.-H. ; Tseng, F.G.

Author_Institution

Nat. Tsing Hua Univ., Hsinchu

fYear

2007

fDate

10-14 June 2007

Firstpage

563

Lastpage

566

Abstract

In this work, a novel fabrication process of self-formed polymer nanopillars by reactive ion etching (RIE) is proposed. During this one-step RIE process, polymer nanopillars were generated adjacent XPS surface analysisto glass slide that was partially covered on treated polymer of either PDMS or parylene C. The surface morphologies and water contact angles were compared for different RIE parameters of RF-power and etching time. The aspect-ratio and water contact angle of nanopillar could reach 10 and 162.6deg, respectively. Furthermore, the mechanism of this novel fabrication process was established based on the evidences of nanopillar distribution and XPS surface analysis.

Keywords

X-ray photoelectron spectra; contact angle; nanotechnology; polymers; sputter etching; surface morphology; RIE; XPS surface analysis; high-aspect-ratio; reactive ion etching; self-formed polymer nanopillars fabrication; surface morphology; water contact angle; Actuators; Etching; Fabrication; Glass; Nanopatterning; Polymers; Solid state circuits; Spectroscopy; Surface morphology; USA Councils; PDMS; RIE; XPS; high-aspect-ratio; nanopillars; superhydrophobic;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International

Conference_Location

Lyon

Print_ISBN

1-4244-0842-3

Electronic_ISBN

1-4244-0842-3

Type

conf

DOI

10.1109/SENSOR.2007.4300192

Filename

4300192