DocumentCode
3375888
Title
19% efficient screen- printed cells using a passivated transparent boron back surface field
Author
Das, Arnab ; Kim, Dong Seop ; Meemongkolkiat, Vichai ; Rohatgi, Ajeet
Author_Institution
University Center of Excellence for Photovoltaics Research and Education, School of Electrical and Computer, Engineering, Georgia Institute of Technology, Atlanta, 30332, U.S.A.
fYear
2008
fDate
11-16 May 2008
Firstpage
1
Lastpage
5
Abstract
Boron back surface field is a promising replacement for the industry standard screen-printed Aluminum. However, the use of boron back surface fields is largely confined to laboratory scale solar cells. In order to increase its industrial applicability, we present a method for achieving a high quality boron back surface field using a cheap and safe boron source and short diffusion time. Metal contacts are fabricated using screen-printing, and degradation of rear passivation after contact firing is minimized through optimized screen-printing of local (point) contacts on the rear. On p-type silicon wafers, this process technology has been utilized to achieve, on 4 cm2 cells, efficiency of up to 19.1% with open-circuit voltage of 650 mV.
Keywords
Aluminum; Boron; Laboratories; Lithography; Passivation; Photovoltaic cells; Production; Silicon; Temperature; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 2008. PVSC '08. 33rd IEEE
Conference_Location
San Diego, CA, USA
ISSN
0160-8371
Print_ISBN
978-1-4244-1640-0
Electronic_ISBN
0160-8371
Type
conf
DOI
10.1109/PVSC.2008.4922437
Filename
4922437
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