DocumentCode
3378374
Title
Characterization of the Micro Contact Resistance using a Novel On-Chip Apparatus
Author
Jang, Ben-Hwa ; Tseng, Po-Hsun ; Huang, Hsin-Yu ; Lee, Sheng-Ta ; Fang, Weileun
Author_Institution
Nat. Tsing Hua Univ., Hsinchu
fYear
2007
fDate
10-14 June 2007
Firstpage
1653
Lastpage
1656
Abstract
This study demonstrates an on chip testing apparatus to determine the variation of contact resistance with the contact force as well as to quantify the change of contact surface roughness after certain contact cycles. Consequently, the relationship between contact resistance and interfacial roughness can be characterized. Moreover, the method to calibrate the parasitic resistance for the contact resistance measurement is presented. The resistance of the insulated film formed on the contact interfaces also can be extracted. The experimental results show that mechanical cycling causes an increase in contact resistance and interfacial roughness. In summary, the present on chip apparatus provides detailed information regarding the micro contact testing, and further enables the improvement of RF-MEMS switches and micro-connectors performances.
Keywords
contact resistance; microswitches; surface roughness; contact force; contact surface roughness; film insulation; interfacial roughness; microconnectors performances; microcontact resistance; onchip apparatus; parasitic resistance; Contact resistance; Data mining; Electrical resistance measurement; Insulation; Radiofrequency microelectromechanical systems; Rough surfaces; Semiconductor device measurement; Surface resistance; Surface roughness; Testing; Contact force; Contact resistance; Roughness;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International
Conference_Location
Lyon
Print_ISBN
1-4244-0842-3
Electronic_ISBN
1-4244-0842-3
Type
conf
DOI
10.1109/SENSOR.2007.4300467
Filename
4300467
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