DocumentCode
3378742
Title
Performance evaluation of 90 nm InGaAs HEMTs
Author
Mohapatra, Meryleen ; Mohapatra, Arupa ; Panda, Anup Kumar
Author_Institution
ECE Dept., Siksha ´O´ Anusandhan Univ., Bhubaneswar, India
fYear
2011
fDate
21-22 July 2011
Firstpage
291
Lastpage
294
Abstract
We have studied the suitability of nano-meter-scale InGaAs HEMTs as a high speed, low power logic technology for beyond CMOS applications.To this end, we have designed an enhancement-mode 90nm gate-length InGaAs HEMT with excellent logic figure of merit. The barrier and buffer materials are changed and their input and output characteristics are compared. The output current generated by the HEMT with InAlAsP as buffer and barrier layer is nearly three times as that of HEMT with InAlAs as the buffer and barrier layer. Similarly input characteristics for the HEMT with InAlAsP as buffer and barrier shows better performance as compared to other barrier and buffer layers.
Keywords
III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; indium compounds; low-power electronics; nanoelectronics; InAlAsP; InGaAs; barrier layer; buffer material; low power logic technology; nanometer-scale InGaAs HEMT; size 90 nm; HEMTs; Indium gallium arsenide; Indium phosphide; Logic gates; MODFETs; 2 Dimensional gas model; High electron mobility transistor (HEMT); InGaAs;
fLanguage
English
Publisher
ieee
Conference_Titel
Signal Processing, Communication, Computing and Networking Technologies (ICSCCN), 2011 International Conference on
Conference_Location
Thuckafay
Print_ISBN
978-1-61284-654-5
Type
conf
DOI
10.1109/ICSCCN.2011.6024562
Filename
6024562
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