DocumentCode
3380558
Title
Quarter- and sub-quarter-micron optical lithography
Author
Lin, B.J.
Author_Institution
IBM Gen. Technol. Div., Hopewell Junction, NJ, USA
fYear
1991
fDate
22-24 May 1991
Firstpage
16
Lastpage
21
Abstract
Will optical lithography finally have reached its ultimate limit at a quarter micrometer minimum feature size? The author shows the obstacles in the projection and the resist systems that prevent optical lithography from performing at its theoretical limit as well as means to further extend the theoretical limit. The requirements on the mask, the projection optics, the resist, and the alignment system to support quarter-and sub-quarter-micrometer optical lithography are covered
Keywords
integrated circuit technology; photolithography; 0.25 micron; alignment system; depth of focus budget; minimum feature size; projection optics; quarter-micron optical lithography; resist systems; sub-quarter-micron optical lithography; Circuits; Focusing; Lithography; Optical distortion; Optical imaging; Optical refraction; Optical sensors; Optical variables control; Resists; Surfaces;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, Systems, and Applications, 1991. Proceedings of Technical Papers, 1991 International Symposium on
Conference_Location
Taipei
ISSN
1524-766X
Print_ISBN
0-7803-0036-X
Type
conf
DOI
10.1109/VTSA.1991.246720
Filename
246720
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