DocumentCode
3381271
Title
Extraction of defect characteristics for yield estimation using the double bridge test structure
Author
Khare, J.B. ; Daniels, B.J. ; Campbell, D.M. ; Thomas, M.E. ; Maly, W.
Author_Institution
Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
fYear
1991
fDate
22-24 May 1991
Firstpage
428
Lastpage
432
Abstract
Discusses the use of special test structures and algorithms needed to extract the defect characteristics for accurate yield estimation. By using the double bridge test structure, which can be applied to obtain defect size distributions in the metal layer, the basic elements of the defect extraction algorithms are demonstrated. Data from a fabrication experiment is used to illustrate the algorithms
Keywords
VLSI; bridge instruments; integrated circuit testing; monolithic integrated circuits; defect characteristics; defect extraction; defect size distributions; double bridge test structure; metal layer; yield estimation; Accuracy; Bridges; Contamination; Data mining; Fabrication; Integrated circuit modeling; Manufacturing; Resource management; Testing; Yield estimation;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, Systems, and Applications, 1991. Proceedings of Technical Papers, 1991 International Symposium on
Conference_Location
Taipei
ISSN
1524-766X
Print_ISBN
0-7803-0036-X
Type
conf
DOI
10.1109/VTSA.1991.246755
Filename
246755
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