• DocumentCode
    3385648
  • Title

    Composition variation of InGaAsP grown on (111)B faceted V-groove InP substrates by gas source molecular beam epitaxy

  • Author

    Wang, J. ; Thompson, D.A. ; Robinson, B.J. ; Simmons, J.G.

  • Author_Institution
    Centre for Electrophotonic Mater. & Devices, McMaster Univ., Hamilton, Ont., Canada
  • fYear
    1996
  • fDate
    21-25 Apr 1996
  • Firstpage
    511
  • Lastpage
    514
  • Abstract
    The authors have grown 40 nm thick InGaAsP layers by gas source molecular beam epitaxy on V-groove etched (100) InP substrates. Transmission electron microscopy (TEM) has been used to examine defect information and layer thickness; energy dispersive X-ray analysis (EDX) has been used to measure the composition variation along the sidewalls and at the bottoms of the V-grooves. Based on the measured spatial distribution of composition, the strain and energy bandgap distributions are calculated. These are compared to low-temperature photoluminescence energy-bandgap measurements
  • Keywords
    III-V semiconductors; X-ray chemical analysis; chemical beam epitaxial growth; crystal defects; energy gap; gallium arsenide; gallium compounds; indium compounds; photoluminescence; semiconductor epitaxial layers; semiconductor growth; surface structure; transmission electron microscopy; (111)B faceted V-groove InP substrates; 40 nm; EDX; GSMBE; InGaAsP; InP; TEM; V-groove etched (100) InP substrates; V-grooves; composition variation; defect information; energy bandgap distributions; energy dispersive X-ray analysis; gas source molecular beam epitaxy; layer thickness; low-temperature photoluminescence energy-bandgap measurements; sidewalls; spatial distribution; strain; transmission electron microscopy; Dispersion; Energy measurement; Etching; Indium phosphide; Information analysis; Molecular beam epitaxial growth; Strain measurement; Substrates; Thickness measurement; Transmission electron microscopy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 1996. IPRM '96., Eighth International Conference on
  • Conference_Location
    Schwabisch-Gmund
  • Print_ISBN
    0-7803-3283-0
  • Type

    conf

  • DOI
    10.1109/ICIPRM.1996.492295
  • Filename
    492295