DocumentCode
3389775
Title
Intelligent EB test system for automatic VLSI fault tracing
Author
Miura, Katsuyoshi ; Nakamae, Koji ; Fujioka, Hiromu
Author_Institution
Dept. of Inf. & Comput. Sci., Osaka Univ., Japan
fYear
1999
fDate
1999
Firstpage
335
Lastpage
340
Abstract
An intelligent EB test system for automatic VLSl fault tracing is described. In order to control the system flexibly, we use the parameters: reliability of measurement P; and the importance of the interconnection I. The former represents the degree of faith in information obtained through measurement. The latter expresses the degree of reduction in the number of probing points after measuring the current selected interconnection, as compared with the case where the measurement of the current selected interconnection is skipped. Utilizing the two parameters, the system judges whether information obtained through measurement is reliable or not, and controls the fault-tracing sequence. Besides, when the fault tracing is finished, the reliability of the fault-tracing path Q is evaluated. This parameter indicates the probability that the localized original is the true origin of the faulty signal detected on the external pad. The system is implemented on a production system. We simulate the fault tracing on the circuit data of a self-made microprocessor to show its validity
Keywords
VLSI; automatic test equipment; automatic testing; electron beam testing; fault location; integrated circuit testing; intelligent control; logic testing; production testing; reliability; automatic VLSI fault tracing; fault-tracing path reliability evaluation; fault-tracing sequence control; intelligent EB test system; probing points; production system; Automatic control; Automatic testing; Circuit faults; Control systems; Current measurement; Integrated circuit interconnections; Intelligent systems; Signal detection; System testing; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Test Symposium, 1999. (ATS '99) Proceedings. Eighth Asian
Conference_Location
Shanghai
ISSN
1081-7735
Print_ISBN
0-7695-0315-2
Type
conf
DOI
10.1109/ATS.1999.810772
Filename
810772
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