DocumentCode
3431945
Title
Multicriteria dynamic dispatching schema for balancing the load on lithographic tools in wafer fabrication
Author
Pan, Chen-Chung ; Lo, Hsi-Lo ; Chang, Chuan-Chung
Author_Institution
Winbond Electron. Corp., Hsinchu, Taiwan
fYear
2002
fDate
10-11 Dec. 2002
Firstpage
183
Lastpage
186
Abstract
As the requirement of critical dimension and overlay control are getting tighter and tighter, one way to meet this requirement is to dedicate identical scanner for running several critical layers. This constraint of scanner dedication can reduce scanner´s utilization, hence reduce fab productivity. The idea proposed in this article is to keep the loading balance among key scanners for maximizing their utilization.
Keywords
VLSI; integrated circuit manufacture; lithography; production control; productivity; resource allocation; wafer-scale integration; VLSI processing; critical dimension; dynamic dispatching; lithographic tools; loading balance; productivity; scanner dedication; scanner utilization; wafer fabrication; Current measurement; Dispatching; Electronics industry; Fabrication; Industrial control; Industrial electronics; Job shop scheduling; Productivity; Textile industry; Time measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing Technology Workshop, 2002
Print_ISBN
0-7803-7604-8
Type
conf
DOI
10.1109/SMTW.2002.1197405
Filename
1197405
Link To Document