• DocumentCode
    3432687
  • Title

    An Improved Parasitic Resistance Model of Nano-Scale MOSFET

  • Author

    Hao Xu-Chun ; Dai Yue-Hua ; Chen Jun-ning ; Ke Dao-Ming ; Sun Jia-E

  • Author_Institution
    Dept. of Electron. Sci. & Technol., Anhui Univ., Hefei
  • fYear
    2008
  • fDate
    12-14 Oct. 2008
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    The reason that existing models have underestimated the parasitic resistance of nano-scale MOSFET biased at low gate voltage was discussed. Then an improved resistance model was proposed. Finally, the influences of several technical parameters on the parasitic resistance were analyzed through numerical simulation, and some directions and measures might be taken to reduce the parasitic resistance.
  • Keywords
    MOSFET; electric resistance; nanotechnology; semiconductor device models; low gate voltage; nanoscale MOSFET; parasitic resistance model; Electric resistance; Electrical resistance measurement; Electronic mail; Electronics industry; Low voltage; MOS devices; MOSFET circuits; Numerical simulation; Parasitic capacitance; Sun;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Wireless Communications, Networking and Mobile Computing, 2008. WiCOM '08. 4th International Conference on
  • Conference_Location
    Dalian
  • Print_ISBN
    978-1-4244-2107-7
  • Electronic_ISBN
    978-1-4244-2108-4
  • Type

    conf

  • DOI
    10.1109/WiCom.2008.428
  • Filename
    4678337