• DocumentCode
    3435664
  • Title

    VLSI scaling trends and challenges

  • Author

    Rusu, Stefan

  • fYear
    2001
  • fDate
    2001
  • Abstract
    This article discusses trends in VLSI technology evolution. It concentrates on challenges to VLSI scaling, including transistor scaling, interconnect scaling, leakage currents and silicon-on-insulator technology. It concludes that we still have not found a fundamental barrier to extending Moore´s law and that the major challenge to scaling in the future will be power and efficiency
  • Keywords
    VLSI; integrated circuit technology; Moore´s law; SOI technology; VLSI technology scaling; interconnect scaling; leakage currents; transistor scaling; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Circuits and Systems, 2001. Tutorial Guide: ISCAS 2001. The IEEE International Symposium on
  • Conference_Location
    Sydney, NSW
  • Print_ISBN
    0-7803-7113-5
  • Type

    conf

  • DOI
    10.1109/TUTCAS.2001.946980
  • Filename
    946980
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3435664