• DocumentCode
    3435686
  • Title

    On the accuracy of Elmore-based Delay Models

  • Author

    Dos Santos, Glauco B V ; Reimann, Tiago J. ; de O.Johann, M. ; da L.Reis, R.A.

  • Author_Institution
    Programa de Pos Grad. em Microeletronica - PGMICRO, UFRGS, Porto Alegre, Brazil
  • fYear
    2009
  • fDate
    13-16 Dec. 2009
  • Firstpage
    447
  • Lastpage
    450
  • Abstract
    We evaluate Elmore-based Interconnect Delay Models under nanoscale technology parameters. Due to a large delay overestimation Elmore delay provides at specific nodes, some attempts to provide more accurate models have been made. However, without reasonable parameters corresponding to actual cmos processes generations, the evaluation of the derived models is potentially dubitable. With technology parameters corresponding to the smaller feature sizes available, we evaluate the ac-curacy of Elmore-based delay models in nowadays VLSI scenarios. Besides an overview of the delay models behavior along technological scaling, we measure the different accuracy for intermediate/local and long/global interconnects.
  • Keywords
    integrated circuit interconnections; nanotechnology; CMOS processes generations; Elmore-based interconnect delay models; delay overestimation; nanoscale technology; technological scaling; Analytical models; CMOS process; CMOS technology; Capacitance; Delay effects; Delay estimation; Physics computing; Routing; Semiconductor device modeling; Very large scale integration; Delay Models; Elmore Delay; Interconnect Modeling; Nanoscale technologies; component;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics, Circuits, and Systems, 2009. ICECS 2009. 16th IEEE International Conference on
  • Conference_Location
    Yasmine Hammamet
  • Print_ISBN
    978-1-4244-5090-9
  • Electronic_ISBN
    978-1-4244-5091-6
  • Type

    conf

  • DOI
    10.1109/ICECS.2009.5410894
  • Filename
    5410894