FSS array generation by optical means

We have demonstrated a basic technique for optically generating arrays of periodic grids as a pseudo-metallic, electron-hole plasma region within a semiconductor wafer. The wafers used were high resistivity silicon to give dielectric-like dark behaviour, in order to contrast with the generated plasma. The theory of the work is based on the characterisation of the plasma by means of its surface impedance, which in turn is dependent on the complex permittivity. We have demonstrated theoretically, generation dimensions. Results have been presented in the frequency range 18-40 GHz to confirm that grids have been optically cast onto the wafers using negative image masks of the desired pattern.