• DocumentCode
    343866
  • Title

    Near field distributions in radial line slot antennas for surface wave coupled plasma generation

  • Author

    Yamamoto, T. ; Ono, H. ; Ando, M. ; Goto, N. ; Ishii, N.

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., Yamagata Univ., Yonezawa, Japan
  • Volume
    2
  • fYear
    1999
  • fDate
    11-16 July 1999
  • Firstpage
    986
  • Abstract
    The near field distributions in radial line slot antennas (RLSA) for surface wave coupled plasma (SWP) are examined. The RLSA are suitable for uniform, high density and large-area plasma generation. In order to realize higher productivity, quick evacuation of reaction gas a narrow gap process space is highly required. Since a wafer is placed close to the antenna aperture in this case, the evaluation of the electromagnetic near-fields in the RLSA for the plasma process is effective and indispensable. Plasma distribution control by changing the slot pattern is also possible based upon the information of the near field distributions. A novel slot pattern, which has many transverse slots, is fabricated and tested. The exponential attenuation of the fields in the boresight direction is measured and the interesting and remarkable characteristics of the novel RLSA for SWP process are confirmed.
  • Keywords
    antenna radiation patterns; antennas in plasma; electromagnetic fields; plasma production; slot antenna arrays; antenna aperture; boresight direction; electromagnetic near-fields; exponential attenuation; large-area plasma generation; near field distributions; plasma distribution control; plasma process; radial line slot antennas; reaction gas evacuation; slot pattern; surface wave coupled plasma generation; transverse slots; uniform plasma generation; wafer; Aperture antennas; Couplings; Plasma density; Plasma measurements; Plasma properties; Plasma waves; Productivity; Slot antennas; Surface waves; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Antennas and Propagation Society International Symposium, 1999. IEEE
  • Conference_Location
    Orlando, FL, USA
  • Print_ISBN
    0-7803-5639-x
  • Type

    conf

  • DOI
    10.1109/APS.1999.789478
  • Filename
    789478