Patterning of Functional Materials by Pulsed Laser Deposition through Nanostencils

We present how various features drawn in a miniature shadow-mask (nanostencil) can be efficiently transferred to a surface in the form of 3D nanostructures of metals (Pt, Cr), semiconductors (Ge) or complex oxides (e.g. BaTiO3) by room temperature pulsed laser deposition (PLD) and stenciling. Using the proposed method, there is no aggressive interaction with the substrate, but selective deposition of the material by simply interposing a sieve with apertures down to 100 nm between the deposition source and the substrate. Nanostenciling allows organizing the structures in given architectures, with high accuracy, while reducing drastically the number of processes present in resist-based lithography. The material deposited through the stencil mask conserves the desired functionality even at the level of the individual nanostructures. The patterning process is simple and rapid since it is not implying additional processing steps to the deposition process; it is also parallel, resist-less and without interfering with the structures natural growth dynamics. Nanostenciling can be performed in high or ultra high vacuum and is suitable for parallel prototyping of fragile or functionalized surfaces.