DocumentCode
3454372
Title
Effect of high-frequency variation on ArF photoresist deformation during superimposed dual frequency (DFS) capacitively coupled plasma etching
Author
Kim, H. ; Cho, S.H. ; Lee, N.-E.
fYear
2004
fDate
Oct. 27-29, 2004
Firstpage
192
Lastpage
193
Keywords
Etching; Frequency; Hafnium; Plasma applications; Plasma devices; Plasma materials processing; Plasma waves; Resists; Rough surfaces; Surface roughness;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN
4-99024720-5
Type
conf
DOI
10.1109/IMNC.2004.245789
Filename
1459539
Link To Document