• DocumentCode
    3455056
  • Title

    A Novel Low Leakage Current VPT(Vertical Pillar Transistor) Integration for 4F2 DRAM Cell Array with sub 40 nm Technology

  • Author

    Yoon, Jae-Man ; Lee, Kangyoon ; Park, Seung-Bae ; Kim, Seong-Goo ; Seo, Hyoung-Won ; Son, Young-Woong ; Kim, Bong-Soo ; Chung, Hyun-Woo ; Lee, Choong-Ho ; Lee, Won-Sok ; Kim, Dong-Chan ; Park, Donggun ; Lee, Wonshik ; Ryu, Byung-Il

  • Author_Institution
    Semiconductor R&D Division, Samsung Electronics Co., San #24, Nongseo-Dong, Kiheung-Gu, Yongin-City, Kyunggi-Do, 449-711, Korea. Tel) 82-31-209-4741, Fax) 82-31-209-3274, E-mail) jaeman.yoon@samsung.com
  • fYear
    2006
  • fDate
    26-28 June 2006
  • Firstpage
    259
  • Lastpage
    260
  • Keywords
    Doping; Etching; Impact ionization; Investments; Ion implantation; Leakage current; Random access memory; Research and development; Silicon compounds; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference, 2006 64th
  • Conference_Location
    State College, PA, USA
  • ISSN
    1548-3770
  • Print_ISBN
    0-7803-9748-7
  • Type

    conf

  • DOI
    10.1109/DRC.2006.305083
  • Filename
    4097627