Composition and nanostructure of carbon/silicon graded film produced by ionization-assisted deposition

Author

Mano, Tsuyoshi ; Sugiyama, Osamu ; Shibuya, Yoshio ; Nakayama, Hiroki ; Taka, Osamu

fYear

2004

fDate

Oct. 27-29, 2004

Firstpage

282

Lastpage

283

Keywords

Acceleration; Argon; Bonding; Carbon compounds; Chemical analysis; Etching; Semiconductor films; Silicon; Substrates; Titanium alloys;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International

Print_ISBN

4-99024720-5

Type

DOI

10.1109/IMNC.2004.245652

Filename

1459586

Link To Document