DocumentCode
3456263
Title
Proposal of an analysis model of resist edge roughness caused by polymer-aggregate detachment in electron beam lithography
Author
Niu, H. ; Hosokawa, T. ; Kusano, Y. ; Kotera, M.
fYear
2004
fDate
Oct. 27-29, 2004
Firstpage
316
Lastpage
317
Keywords
Electron beams; Electronic mail; Information analysis; Lithography; Polymers; Power engineering and energy; Proposals; Resists; Rough surfaces; Surface roughness;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2004. Digest of Papers. 2004 International
Print_ISBN
4-99024720-5
Type
conf
DOI
10.1109/IMNC.2004.245670
Filename
1459604
Link To Document