Successful implementation of a MEMS micromirror array in a lithograpy illumination system

Author

Endendijk, Wilfred ; Mulder, Max ; van Drieenhuizen, Bert

Author_Institution

ASML, Veldhoven, Netherlands

fYear

2013

fDate

16-20 June 2013

Firstpage

2564

Lastpage

2567

Abstract

In this paper, the implementation of a controllable MEMS-micromirror into the illumination system of an ASML lithography scanner is described. Being the industry´s technology leader, ASML is keen on implementing new technology to improve lithography performance. The introduction of a controllable MEMS micromirror array in the illumination system opens many opportunities for improvements. To make a MEMS-micromirror array meet the imaging specifications, ASML´s expertise on system design and high performance control design was used to come to a timely and affordable solution. This paper will show an overview of the system and control design and show the results that our customers achieve.

Keywords

lighting; micro-optomechanical devices; micromirrors; photolithography; ASML lithography scanner; MEMS micromirror array; imaging specification; lithography illumination system; Adaptive optics; Imaging; Lighting; Lithography; Mirrors; Sensitivity; System analysis and design; FlexRay Illumination; Lithography; Micromirrors; System design;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS & EUROSENSORS XXVII), 2013 Transducers & Eurosensors XXVII: The 17th International Conference on

Conference_Location

Barcelona

Type

conf

DOI

10.1109/Transducers.2013.6627329

Filename

6627329