DocumentCode
3465298
Title
An All-Digital On-Chip Process-Control Monitor for Process-Variability Measurements
Author
Klass, Fabian ; Jain, Ashish ; Hess, Greg ; Park, Brian
Author_Institution
P. A. Semi, Santa Clara, CA
fYear
2008
fDate
3-7 Feb. 2008
Firstpage
408
Lastpage
623
Abstract
Process variability has become a major challenge in nanometer technologies. Understanding process variability is therefore a key to designing successful low-power multi-million gate SoCs. An all-digital on-chip process control-monitor (PCM) that measures process variability is described.
Keywords
CMOS logic circuits; integrated circuit design; integrated circuit measurement; statistical analysis; system-on-chip; CMOS process; all-digital on-chip process-control monitor; low-power multimillion gate SoC design; nanometer technologies; process-variability measurements; statistics; CMOS process; Circuit testing; Clocks; Frequency; Inverters; Jitter; MOS devices; Monitoring; Phase change materials; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Circuits Conference, 2008. ISSCC 2008. Digest of Technical Papers. IEEE International
Conference_Location
San Francisco, CA
Print_ISBN
978-1-4244-2010-0
Electronic_ISBN
978-1-4244-2011-7
Type
conf
DOI
10.1109/ISSCC.2008.4523230
Filename
4523230
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