Electron-beam processed SAW devices for sensor applications

Author

Loschonsky, Marc ; Eisele, David ; Masson, Jeremy ; Alzuaga, Sébastien ; Dadgar, Armin ; Ballandras, Sylvain ; Reindl, Leonhard

Author_Institution

Dept. of Microsyst. Eng. (IMTEK), Univ. of Freiburg, Freiburg

fYear

2009

fDate

23-26 March 2009

Firstpage

1

Lastpage

4

Abstract

In this paper, electron-beam (e-beam) lithography for processing of surface acoustic wave devices is investigated, and its suitability for large-scale processing discussed. Electron-beam lithography is used for exposure of surface acoustic wave (SAW) resonator patterns on polymethyl methacrylate (PMMA) coated piezoelectric substrates. Electron-beam lithography can be used for high frequency SAW designs, due to a minimal finger width of 100 nm to 400 nm. Such SAW devices can be used for high-frequency sensor applications. This contribution will consider processing, on-wafer characterization, and characterization of sensor effects in instrumentation applications.

Keywords

electron beam lithography; polymers; surface acoustic wave sensors; SAW devices; electron beam lithography; high-frequency sensor applications; instrumentation applications; on-wafer characterization; polymethyl methacrylate; resonator patterns; Acoustic sensors; Acoustic waves; Fingers; Frequency; Instruments; Large-scale systems; Lithography; Sensor phenomena and characterization; Surface acoustic wave devices; Surface acoustic waves; Electron beam lithography; high frequency; sensors; surface acoustic waves;

fLanguage

English

Publisher

ieee

Conference_Titel

Systems, Signals and Devices, 2009. SSD '09. 6th International Multi-Conference on

Conference_Location

Djerba

Print_ISBN

978-1-4244-4345-1

Electronic_ISBN

978-1-4244-4346-8

Type

conf

DOI

10.1109/SSD.2009.4956715

Filename

4956715