• DocumentCode
    3467252
  • Title

    F6: Transistor Variability in Nanometer-Scale Technologies

  • Author

    Ho, Ron

  • Author_Institution
    Sun Microsystems, Menlo Park, CA
  • fYear
    2008
  • fDate
    3-7 Feb. 2008
  • Firstpage
    660
  • Lastpage
    661
  • Keywords
    Computer architecture; Design engineering; Design for manufacture; Design optimization; Integrated circuit technology; Lithography; Logic design; Manufacturing; Transistors; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Circuits Conference, 2008. ISSCC 2008. Digest of Technical Papers. IEEE International
  • Conference_Location
    San Francisco, CA
  • Print_ISBN
    978-1-4244-2010-0
  • Electronic_ISBN
    978-1-4244-2011-7
  • Type

    conf

  • DOI
    10.1109/ISSCC.2008.4523330
  • Filename
    4523330
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3467252