Optical Characteristics of Nano-crystalline Diamond Films as X-ray Lithography Masks for Integrated Circuit Fabrication

Author

Wang, Lin-jun ; Liu, Jian-Min ; Su, Qing-Feng ; Xu, Run ; Peng, Hong-Yan ; Shi, Wei-Min ; Xia, Yi-Ben

Author_Institution

Sch. of Mater. Sci. & Eng., Shanghai Univ.

fYear

2006

fDate

23-26 Oct. 2006

Firstpage

1098

Lastpage

1100

Abstract

In this paper, the structure, morphology and optical properties of nano-crystalline diamond (NCD) films, deposited by hot-filament chemical vapor deposition (HFCVD) method under different carbon concentration, are investigated. With increasing the carbon concentration during the film deposition, the diamond grain size is reduced and thus a smooth diamond film can be obtained. According to the data on the absorption coefficient in the wavelength range from 200 to 1100 nm, the optical gap of the NCD films decreases from 4.3 eV to 3.2eV with increasing the carbon concentration from 2.0% to 3.0%

Keywords

CVD coatings; X-ray lithography; diamond; integrated circuit technology; masks; nanostructured materials; optical properties; 200 to 1100 nm; X-ray lithography masks; absorption coefficient in; diamond grain size; film deposition; hot-filament chemical vapor deposition; integrated circuit fabrication; nanocrystalline diamond films; optical characteristics; optical gap; Absorption; Chemical vapor deposition; Diamond-like carbon; Grain size; Integrated optics; Morphology; Optical device fabrication; Optical films; Photonic integrated circuits; X-ray lithography;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on

Conference_Location

Shanghai

Print_ISBN

1-4244-0160-7

Electronic_ISBN

1-4244-0161-5

Type

conf

DOI

10.1109/ICSICT.2006.306693

Filename

4098334