• DocumentCode
    3468417
  • Title

    Electrostatic Discharge Protection in the Nano-Technology - Will We be able to Provide ESD Protection in the Future?

  • Author

    Voldman, Steven H.

  • Author_Institution
    Int. Bus. Machines (IBM) Corp., Essex Junction, VT
  • fYear
    2006
  • fDate
    23-26 Oct. 2006
  • Firstpage
    1109
  • Lastpage
    1112
  • Abstract
    Electrostatic discharge (ESD) phenomenon will play a critical role in the introduction, manufacturing and implementation of present day semiconductor devices and future nano-structures as presented by Voldman (2002). In the future, the ability to produce nanostructures may be limited by the ESD sensitivity of these electronic and mechanical elements. The ESD technology roadmap has been shown, highlighting a decreasing ESD robustness with technology scaling. ESD technology scaling issues in advanced CMOS, RF CMOS, silicon germanium, to gallium arsenide will be reviewed. ESD issues from wafer-level charging, on-chip protection, to off-chip protection have been discussed. In addition trends in RF MEMs, FINFETs, magnetic recording, photo-masks to carbon nano-tubes (CNT) have been discussed.
  • Keywords
    MOSFET; carbon nanotubes; electrostatic discharge; magnetic recording; masks; micromechanical devices; nanostructured materials; nanotechnology; ESD sensitivity; ESD technology roadmap; FINFET; RF MEMS; carbon nanotubes; electrostatic discharge protection; magnetic recording; nanostructures; nanotechnology; photo-masks; semiconductor devices; technology scaling; wafer-level charging; CMOS technology; Electrostatic discharge; Nanoscale devices; Protection; Radio frequency; Robustness; Semiconductor device manufacture; Semiconductor devices; Semiconductor nanostructures; Silicon germanium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
  • Conference_Location
    Shanghai
  • Print_ISBN
    1-4244-0160-7
  • Electronic_ISBN
    1-4244-0161-5
  • Type

    conf

  • DOI
    10.1109/ICSICT.2006.306696
  • Filename
    4098337