DocumentCode
3469705
Title
Reliable screening for zero-defect quality improvement by temperature gradient testing
Author
Wang, Qijie ; Kyuho, T. ; Saihara, H. ; Kitamura, Takamitsu ; Yonemura, K. ; Kariyazono, H.
Author_Institution
TOSHIBA, Oita, Japan
fYear
2013
fDate
6-6 Sept. 2013
Firstpage
1
Lastpage
4
Abstract
This paper prevents a new reliable screening for Zero Defect quality improvement of deep sub-micron defects. Applications and results show this method is effective to reject the defective non-outlier dies of abnormal temperature gradient tendency. Challenges of production implementation have been overcome in a multi-step post-processing module including the new screening. Collected wafer-sort mapping data and failure analysis of the rejects have proved the capability of the proposed method in improving product quality and reducing customer returns with very acceptable yield loss.
Keywords
automatic test equipment; integrated circuit testing; collected wafer-sort mapping data; deep sub-micron defects; defective nonoutlier dies; failure analysis; multistep post-processing module; reliable screening; temperature gradient testing; zero-defect quality improvement; Abstracts; DPPM; EFR; IDDQ; PAT; SPP; TGT; Zero Defect;
fLanguage
English
Publisher
ieee
Conference_Titel
e-Manufacturing & Design Collaboration Symposium (eMDC), 2013
Conference_Location
Hsinchu
Type
conf
DOI
10.1109/eMDC.2013.6756043
Filename
6756043
Link To Document