DocumentCode
3475208
Title
Preparation and characterisation of exfoliated graphene for quantum resistance metrology
Author
Rietveld, G. ; van Elferen, H.J. ; Giesbers, A.J.M. ; Veligura, A. ; Zeitler, U. ; Novoselov, K.S. ; van Wees, B.J. ; Geim, A.K. ; Maan, J.C.
Author_Institution
Van Swinden Lab. (VSL), Netherlands
fYear
2010
fDate
13-18 June 2010
Firstpage
627
Lastpage
628
Abstract
Exfoliated graphene samples have been prepared for use in quantum resistance metrology. Good progress is recently made in achieving contact resistances to graphene of less than 50 Ω. Details are presented on the handling and measurement of graphene samples.
Keywords
contact resistance; graphene; C; contact resistances; exfoliated graphene; quantum resistance metrology; Annealing; Chromium; Electrical resistance measurement; Electrons; Gold; Laboratories; Metrology; Optical microscopy; Physics; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Precision Electromagnetic Measurements (CPEM), 2010 Conference on
Conference_Location
Daejeon
Print_ISBN
978-1-4244-6795-2
Type
conf
DOI
10.1109/CPEM.2010.5544190
Filename
5544190
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