DocumentCode
3475557
Title
Non-Arrhenius Temperature Acceleration and Stress-Dependent Voltage Acceleration for Semiconductor Device Involving Multiple Failure Mechanisms
Author
Qin, Jin ; Bernstein, Joseph B.
Author_Institution
Maryland Univ., College Park, MD
fYear
2006
fDate
Oct. 16 2006-Sept. 19 2006
Firstpage
93
Lastpage
97
Abstract
In this paper, we study temperature and voltage acceleration of semiconductor device with multiple intrinsic failure mechanisms involved: hot carrier injection (HCI), time dependent dielectric breakdown (TDDB) and negative bias temperature instability (NBTI). Simulation shows that system activation energy and voltage acceleration parameter depend on stress temperature and voltage. A modified Arrhenius relationship is proposed to model the temperature dependence of device lifetime at given voltage. A modified exponential model is also proposed to model the voltage dependence of device lifetime at given temperature
Keywords
hot carriers; semiconductor device breakdown; semiconductor device models; semiconductor device reliability; thermal stability; hot carrier injection; modified Arrhenius relationship; modified exponential model; multiple failure mechanisms; negative bias temperature instability; non-Arrhenius temperature acceleration; semiconductor device; stress-dependent voltage acceleration; system activation energy; temperature dependence; time dependent dielectric breakdown; Acceleration; Breakdown voltage; Dielectric breakdown; Failure analysis; Hot carrier injection; Human computer interaction; Negative bias temperature instability; Niobium compounds; Semiconductor devices; Temperature dependence;
fLanguage
English
Publisher
ieee
Conference_Titel
Integrated Reliability Workshop Final Report, 2006 IEEE International
Conference_Location
South Lake Tahoe, CA
ISSN
1930-8841
Print_ISBN
1-4244-0296-4
Electronic_ISBN
1930-8841
Type
conf
DOI
10.1109/IRWS.2006.305219
Filename
4098696
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