• DocumentCode
    3476782
  • Title

    Optical Performance of InGaN/AlGaN Double Heterostucture Light Emitting Diodes

  • Author

    Thahab, S.M. ; Hassan, Hesham Ahmed ; Hassan, Z.

  • Author_Institution
    Nano-OptoElectron. Res. & Technol. Lab., Univ. Sains Malaysia, Penang
  • fYear
    2006
  • fDate
    Sept. 2006
  • Firstpage
    13
  • Lastpage
    14
  • Abstract
    A simulation study of the output power characteristics of In0.13Ga0.87N/Al0.1Ga0.9N double heterostructure light emitting diodes (DH LEDs) at room temperature was performed using ISETCAD software. We have selected In 0.13Ga0.87N as the active layer with thickness of 40nm sandwiched between 30 nm n-type Al0.1Ga0.9N and 60nm p-type Al0.15Ga0.85N cladding layers. The output power with value of 0.2 mW was obtained at forward current of 60 mA and with peak emission wavelength at 426 nm. We investigated the effect of doping concentration on the output power and peak emission wavelength. No change in the output power was observed for light doping. We also investigated the effect of varying the thickness of the active layer on the output power
  • Keywords
    III-V semiconductors; aluminium compounds; gallium compounds; indium compounds; light emitting diodes; semiconductor device models; semiconductor doping; semiconductor heterojunctions; wide band gap semiconductors; 0.2 mW; 293 to 298 K; 30 to 60 nm; 426 nm; 60 mA; DH LED; ISETCAD software; InGaN-AlGaN; active layer; doping concentration; forward current; n-type cladding layers; p-type cladding layers; peak emission wavelength; semiconductor double heterostructure light emitting diodes; Aluminum gallium nitride; DH-HEMTs; Doping; Gallium nitride; Light emitting diodes; Modeling; Power generation; Radiative recombination; Stimulated emission; Temperature; AlGaN; InGaN; light emitting diode;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Numerical Simulation of Semiconductor Optoelectronic Devices, 2006. NUSOD '06. International Conference on
  • Conference_Location
    Nanyang Technological University, Nanyang Executive Centre, Singapore, China
  • Print_ISBN
    0-7803-9755-X
  • Type

    conf

  • DOI
    10.1109/NUSOD.2006.306717
  • Filename
    4098757