• DocumentCode
    3488684
  • Title

    Structure-Properties relationships in LiNbO3-based multilayered ferroelectric structures

  • Author

    Bornand, V. ; Papet, Ph ; Henn, F.

  • Author_Institution
    Lab. de Phys. de la Matiere Condensee, CNRS, Montpellier, France
  • fYear
    2005
  • fDate
    11-14 Sept. 2005
  • Firstpage
    466
  • Lastpage
    468
  • Abstract
    We report the growth of LiNbO3 thin films onto In2O3:Sn-coated <111>-Si substrates by standard radio-frequency sputtering. Multi-layer procedures, up to 4 successive deposits, have been developed that can subsequently improve the structural and macroscopic ferroelectric properties of such as-grown composite structures. The enhancement of polarization, as high as 40 C.cm-2 in 4-stacked layers, is attributed to c-oriented seed-layer-induced crystallization (self-polarization) and interfacial (migratory) polarization.
  • Keywords
    ferroelectric thin films; indium compounds; interface phenomena; lithium compounds; polarisation; sputtering; tin; ITO; In2O3:Sn-coated; InSnO; LiNbO3; LiNbO3 thin films growth; Si; Si substrates; composite structures; crystallization; interfacial polarization; multilayer procedures; multilayered ferroelectric structures; radio-frequency sputtering; selfpolarization; structure property; Crystallization; Ferroelectric materials; Indium tin oxide; Polarization; Radio frequency; Random access memory; Sputtering; Substrates; Superlattices; Thin film devices;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrets, 2005. ISE-12. 2005 12th International Symposium on
  • Print_ISBN
    0-7803-9116-0
  • Type

    conf

  • DOI
    10.1109/ISE.2005.1612425
  • Filename
    1612425