DocumentCode
3489536
Title
Epitaxial growth of 1 /spl mu/m thick nonlinear optical KNbO/sub 3/ thin films by pulsed laser deposition with in situ laser annealing
Author
Machida, A. ; Ishida, N. ; Fukaya, S. ; Obara, M.
Author_Institution
Dept. of Electron. & Electr. Eng., Keio Univ., Yokohama, Japan
Volume
3
fYear
1999
fDate
Aug. 30 1999-Sept. 3 1999
Firstpage
630
Abstract
We fabricated a KNbO/sub 3/ [110] thin film on MgO [100] using pulsed laser deposition with in situ laser annealing. We used a KrF laser beam (248 nm, 20 Hz, 10 ns) that is divided into two beams: an ablation beam and an in situ laser annealing beam onto the film surface.
Keywords
epitaxial growth; laser beam annealing; optical films; optical harmonic generation; potassium compounds; pulsed laser deposition; 10 ns; 248 nm; KNbO/sub 3/; KNbO/sub 3/ [110] thin film; KrF; KrF laser beam; MgO; ablation beam; epitaxial growth; film surface; in situ laser annealing; in situ laser annealing beam; nonlinear optical KNbO/sub 3/ thin films; pulsed laser deposition; Annealing; Epitaxial growth; Laser ablation; Laser beams; Molecular beam epitaxial growth; Nonlinear optics; Optical films; Optical pulses; Pulsed laser deposition; Sputtering;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 1999. CLEO/Pacific Rim '99. The Pacific Rim Conference on
Conference_Location
Seoul, South Korea
Print_ISBN
0-7803-5661-6
Type
conf
DOI
10.1109/CLEOPR.1999.817754
Filename
817754
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