• DocumentCode
    3496575
  • Title

    Low voltage field emission from PbZr0.2Ti0.8O3-coated silicon nanotips

  • Author

    Fletcher, P.C. ; Mangalam, R.V.K. ; Martin, L.W. ; King, William P.

  • Author_Institution
    Dept. of Mech. Sci. & Eng., Univ. of Illinois, Urbana, IL, USA
  • fYear
    2013
  • fDate
    20-24 Jan. 2013
  • Firstpage
    437
  • Lastpage
    440
  • Abstract
    We report field emission from nanometer-sharp tips of polarized PbZr0.2Ti0.8O3 (PZT) and silicon. The ferroelectric PZT emitters are a high-density array of single-crystal silicon tips that are coated with a 30 nm thick film of crystalline PZT in a batch fabrication process. The PZT emitter tips begin to emit electrons at fields as low as 2 V/μm and reach threshold emission at fields as low as 3.9 V/μm. This is considerably lower than the threshold field of 7.2 V/μm for uncoated silicon emitter tips. This improvement is about one order of magnitude improvement over previous publications for silicon tips. Using a Fowler-Nordheim analysis, we calculate the effective work function of the PZT film to be 1.00 eV and the field amplification factor to be 1525.
  • Keywords
    elemental semiconductors; epitaxial layers; ferroelectric thin films; field emitter arrays; lead compounds; nanofabrication; nanostructured materials; pulsed laser deposition; silicon; work function; zirconium compounds; Fowler-Nordheim analysis; PZT-Si; batch fabrication; crystalline materials; electron volt energy 1.00 eV; epitaxial film; ferroelectric emitters; field amplification factor; high-density array; low-voltage field emission; nanometer-sharp tip; polarized lead zirconium titanate-coated silicon nanotips; pulsed laser deposition; single crystal silicon tips; size 30 nm; thick film; threshold emission; work function; Arrays; Current measurement; Electric fields; Electron emission; Films; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems (MEMS), 2013 IEEE 26th International Conference on
  • Conference_Location
    Taipei
  • ISSN
    1084-6999
  • Print_ISBN
    978-1-4673-5654-1
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2013.6474272
  • Filename
    6474272