• DocumentCode
    3496621
  • Title

    Combustion and material characterization of porous silicon nanoenergetics

  • Author

    Piekiel, N.W. ; Churaman, W.A. ; Morris, C.J. ; Currano, L.J.

  • Author_Institution
    Army Res. Lab., Adelphi, MD, USA
  • fYear
    2013
  • fDate
    20-24 Jan. 2013
  • Firstpage
    449
  • Lastpage
    452
  • Abstract
    Certain porous silicon (PS) structures have demonstrated energetic characteristics when mixed with an appropriate oxidizer [1-4]. However, limited studies on the effect of PS structure on its combustion have been performed. This work investigates how various material properties of PS films; surface area, porosity and pore size, affect the combustion process. With pore sizes in the range of 2.6-5.2 nm and surface area reaching over 900 m2/g, these materials are capable of considerably fast reactions. Combustion characterization is performed through high speed imaging at a rate of 930,000 frames per second. Propagation speeds in the current study range from 300-1950 m/s, and some relationships between the pore characteristics and the propagation velocity are observed.
  • Keywords
    combustion; elemental semiconductors; explosives; porosity; porous materials; semiconductor thin films; silicon; Si; appropriate mixed oxidizer; combustion process; frames; high speed imaging rate; material properties; pore propagation velocity; pore size; porosity; porous silicon films; porous silicon nanoenergetics; porous silicon structures; surface area; Combustion; Fires; Material properties; Silicon; Surface treatment; System-on-chip;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems (MEMS), 2013 IEEE 26th International Conference on
  • Conference_Location
    Taipei
  • ISSN
    1084-6999
  • Print_ISBN
    978-1-4673-5654-1
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2013.6474275
  • Filename
    6474275