DocumentCode
3497338
Title
Graphene nano-ribbon field-effect transistors as future low-power devices
Author
Ying-Yu Chen ; Sangai, Amit ; Gholipour, Morteza ; Deming Chen
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of Illinois at Urbana-Champaign, Urbana, IL, USA
fYear
2013
fDate
4-6 Sept. 2013
Firstpage
151
Lastpage
156
Abstract
The graphene nano-ribbon field effect transistor (GNRFET) is an emerging technology that received much attention in recent years. Recent work on GNRFET circuit simulations has shown that GNRFETs may have potential in low power applications. In this paper, we review the existing work on GNRFET circuit modeling, compare the two varieties of GNRFETs, Metal-Oxide-Semiconducting-(MOS-)type and Schottky-Barrier-(SB-)type GNRFETs, and thoroughly discuss and explore their respective strengths in terms of delay, power, and noise margin. From this point of view, we discuss their possible applications, especially the use towards low-power computing. Our simulations show that ideal (nonideal) MOS-GNRFET consumes 18% (35%) and 54% (102%) total power as compared to high-performance (HP) Si-CMOS and low-power (LP) Si-CMOS, respectively. SB-GNRFET does not compare favorably to MOS-GNRFET in terms of power consumption. However, ideal (non-ideal) SB-GNRFET has 3% (5.4X) and 0.45% (83.5%) energy-delay product (EDP) compared to Si-CMOS (HP) and Si-CMOS (LP), respectively, while ideal (non-ideal) MOS-GNRFET has 8% (93%) and 1.25% (14.3%) EDP compared to Si-CMOS (HP) and Si-CMOS (LP), respectively.
Keywords
MOSFET; Schottky barriers; field effect transistors; graphene; low-power electronics; nanoribbons; semiconductor device models; C; EDP; GNRFET circuit modeling; MOS-GNRFET; SB-GNRFET; Schottky-barrier GNRFET; energy delay product; graphene nanoribbon field effect transistors; low-power devices; noise margin; Delays; Graphene; Inverters; Logic gates; Metals; Photonic band gap; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Low Power Electronics and Design (ISLPED), 2013 IEEE International Symposium on
Conference_Location
Beijing
Print_ISBN
978-1-4799-1234-6
Type
conf
DOI
10.1109/ISLPED.2013.6629286
Filename
6629286
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