• DocumentCode
    3503302
  • Title

    Near Field-Emission SEM: Primary electron beam generation and comparison with STM

  • Author

    Zanin, Danilo A. ; Cabrera, H. ; De Pietro, L.G. ; Thalmann, M. ; Pescia, D. ; Ramsperger, U.

  • Author_Institution
    Lab. for Solid State Phys., ETH Zurich, Zürich, Switzerland
  • fYear
    2012
  • fDate
    9-13 July 2012
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    In Near Field-Emission Scanning Electron Microscopy the source of the primary beam is only few tens nm away from the target. We report the progress in primary beam generation and compare the performance of the instrument in field emission mode with respect to the well-established Scanning Tunneling Microscopy (STM).
  • Keywords
    field emission electron microscopy; scanning electron microscopy; field emission mode; near field-emission scanning electron microscopy; primary beam generation; primary beam source; Apertures; Contamination; Electron beams; Scanning electron microscopy; Field-Emission; NFESEM; STM;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Nanoelectronics Conference (IVNC), 2012 25th International
  • Conference_Location
    Jeju
  • ISSN
    pending
  • Print_ISBN
    978-1-4673-1983-6
  • Electronic_ISBN
    pending
  • Type

    conf

  • DOI
    10.1109/IVNC.2012.6316839
  • Filename
    6316839
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3503302