• DocumentCode
    3506140
  • Title

    Effect of control parameters for electron beam deposited platinum on PtIr5 coated-silicon surface

  • Author

    Kanth, Sanjeev Kumar ; Park, Byong Chon ; Woon, Song ; Kim, Ho Seob

  • Author_Institution
    Korea Res. Inst. of Stand. & Sci., Daejeon, South Korea
  • fYear
    2012
  • fDate
    9-13 July 2012
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    The dependence of the rate and final height of the electron beam deposited platinum on the control parameters were studied by varying electron probe current density (PCD), accelerating voltage and deposition time.
  • Keywords
    current density; electron beam deposition; electron probes; elemental semiconductors; platinum compounds; silicon; PCD; PtIr; Si; accelerating voltage; control parameter effect; deposition time; electron beam deposition; electron probe current density; Acceleration; Current density; Electron beams; Platinum; Probes; Substrates; Surface treatment; Deposition time; PCD; Platinum deposition;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Nanoelectronics Conference (IVNC), 2012 25th International
  • Conference_Location
    Jeju
  • ISSN
    pending
  • Print_ISBN
    978-1-4673-1983-6
  • Electronic_ISBN
    pending
  • Type

    conf

  • DOI
    10.1109/IVNC.2012.6316973
  • Filename
    6316973
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3506140