Deposition of Ti:sapphire film on quartz and sapphire substrates by laser

Author

Lancok, J. ; Jelinek, M. ; Oswald, J.

Author_Institution

Inst. of Phys., Czechoslovak Acad. of Sci., Prague, Czech Republic

Volume

3

fYear

1999

fDate

Aug. 30 1999-Sept. 3 1999

Firstpage

961

Abstract

We studied the possibility of the deposition of crystalline Ti:sapphire films on sapphire and quartz substrates at low temperatures by ablation using a KrF excimer laser. The structural properties of the films were analysed by X-ray diffraction and electron microprobe analysis. The luminescence was measured using a double grating monochromator. The excitation was performed by an Ar/sup +/ laser at 488 nm. The waveguiding properties of the film were measured by mode spectroscopy. From propagation constants the refractive index and thickness were calculated.

Keywords

X-ray diffraction; electron probe analysis; optical films; optical planar waveguides; photoluminescence; pulsed laser deposition; refractive index; sapphire; titanium; Al/sub 2/O/sub 3/; Al/sub 2/O/sub 3/:Ti; KrF excimer laser; SiO/sub 2/; Ti:sapphire film; X-ray diffraction; double grating monochromator; electron microprobe analysis; laser ablation; luminescence; propagation constants; quartz substrates; refractive index; sapphire substrates; thickness; waveguiding properties; Crystallization; Electrons; Laser ablation; Laser modes; Luminescence; Optical films; Substrates; Temperature; X-ray diffraction; X-ray lasers;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 1999. CLEO/Pacific Rim '99. The Pacific Rim Conference on

Conference_Location

Seoul, South Korea

Print_ISBN

0-7803-5661-6

Type

conf

DOI

10.1109/CLEOPR.1999.817921

Filename

817921