• DocumentCode
    3510781
  • Title

    Moving double probe measurements in copper arc plasma and derivation of plasma parameters

  • Author

    Danaraddi, S.C.

  • Author_Institution
    Dept. of Phys., Basaveshwar Sci. Coll., Karnataka, India
  • fYear
    2004
  • fDate
    1-1 July 2004
  • Firstpage
    402
  • Abstract
    Summary form only given. A moving single probe technique has a reference point since it is biased with reference to any one electrodes of the plasma producing system. However, in some situations such as RF discharges and ionospheric plasma, a reference point is not available to bias the moving single probe. Hence a single moving probe technique is not applicable in such situations and the moving double probe technique is found to be more appropriate. Each probe is biased with respect to the other in this technique. When the two probes in a vertical plane are biased with a potential and allowed to move through arc plasma, collect some charges depending on the magnitude of the biasing potential, geometry of the probes and the time of flight of the probes. Charge collected by the probe hence current flowing to the probe circuit is estimated. The electron temperature, ion density, floating potential and the thermal velocity of ions are estimated. In the present investigations the copper arc current is maintained constant and the arc gaps are varied. It is expected that the electron temperature, ion density and thermal velocity be expected to be the same for all these different arc gaps. The derived results are based on probe measurements supports that the plasma parameters do not depend upon the arc gap, but depends on the arc current.
  • Keywords
    arcs (electric); copper; electrodes; high-frequency discharges; ion density; plasma density; plasma probes; plasma sources; plasma temperature; Cu; RF discharges; arc current; arc gap; biasing potential; copper arc current; copper arc plasma; current flow; electrodes; electron temperature; floating potential; ion density; ionospheric plasma; moving double probe technique; plasma parameters; plasma producing system; probe circuit; thermal velocity; time of flight; Circuits; Copper; Electrodes; Electrons; Geometry; Plasma density; Plasma measurements; Plasma temperature; Probes; Radio frequency;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2004. ICOPS 2004. IEEE Conference Record - Abstracts. The 31st IEEE International Conference on
  • Conference_Location
    Baltimore, MD, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-8334-6
  • Type

    conf

  • DOI
    10.1109/PLASMA.2004.1340176
  • Filename
    1340176