Layer transfer of crystalline Si thin film by metal-assisted chemical etching concerning different H2O2/HF ratios

Author

Lin, Tzu-Ching ; Shiu, Shu-Chia ; Pun, Keng-Lam ; Syu, Hong-Jhang ; Lin, Ching-Fuh

Author_Institution

Grad. Inst. of Electron. Eng., Nat. Taiwan Univ., Taipei, Taiwan

fYear

2012

fDate

3-8 June 2012

Abstract

Thin-film crystalline photovoltaic (PV) cell is a trend for future PV with its potential to achieve low cost and high efficiency. Concerning material utilization efficiency, we propose a method with a fast manufacturing method of thin crystalline Si by chemical solution. To obtain the highest efficiency of material utilization, experiments with different H₂O₂/HF ratio are conducted, where related mechanisms are discussed. Moreover, large-area (87.7 mm²) thin film transferred to glass is demonstrated, and with embedded nanohole structure, lowest optical reflectance of 0.26% is measured. These characteristics show that the fabricated thin film has potential for large-area crystalline thin film PV.

Keywords

elemental semiconductors; etching; glass structure; hydrogen compounds; nanofabrication; photovoltaic cells; semiconductor thin films; silicon; H₂O₂-HF; Si; chemical solution; crystalline Si thin film; embedded nanohole structure; glass; layer transfer; manufacturing method; material utilization; metal-assisted chemical etching; optical reflectance; thin-film crystalline photovoltaic cell; Etching; Glass; Hafnium; Reflectivity; Silicon; Substrates; crystalline materials; etching; nanostructured materials; optical reflection; photovoltaic cells; silicon; thin film devices;

fLanguage

English

Publisher

ieee

Conference_Titel

Photovoltaic Specialists Conference (PVSC), 2012 38th IEEE

Conference_Location

Austin, TX

ISSN

0160-8371

Print_ISBN

978-1-4673-0064-3

Type

conf

DOI

10.1109/PVSC.2012.6317633

Filename

6317633