• DocumentCode
    3514422
  • Title

    Eliminating the galvanic effect for microdevices fabricated with PolyMUMPs®

  • Author

    Syed, Abdullah ; Mu, Luye ; Shavezipur, Mohammad ; Nieva, Patricia

  • Author_Institution
    Mech. & Mechatron. Eng., Univ. of Waterloo, Waterloo, ON
  • fYear
    2008
  • fDate
    15-15 Oct. 2008
  • Firstpage
    197
  • Lastpage
    200
  • Abstract
    The galvanic effect may notably damage associated micro-electro-mechanical devices fabricated with processes involving electrochemical steps. This effect is commonly observed when a significant amount of gold is used to design MEMS devices that are fabricated using PolyMUMPsreg. To study and overcome the galvanic effect on these devices, three methods are proposed: (1) connecting the device to a poly0 ring; (2) increasing the device surface area and (3) grounding the device to the substrate. The three methods are compared for their effectiveness in preventing galvanic corrosion. It is observed that although all three methods can considerably restrain the galvanic effect, grounding the device to the substrate is the best solution.
  • Keywords
    micromechanical devices; PolyMUMP; galvanic effect elimination; micro-electro-mechanical device fabrication; Corrosion; Fabrication; Galvanizing; Gold; Grounding; Hafnium; Microelectromechanical devices; Micromechanical devices; Silicon; Wet etching; HF wet etch release; MEMS corrosion; Microdevices; PolyMUMPs®; electrochemical etching; galvanic effect;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microsystems and Nanoelectronics Research Conference, 2008. MNRC 2008. 1st
  • Conference_Location
    Ottawa, Ont.
  • Print_ISBN
    978-1-4244-2920-2
  • Electronic_ISBN
    978-1-4244-2921-9
  • Type

    conf

  • DOI
    10.1109/MNRC.2008.4683412
  • Filename
    4683412