DocumentCode
3514422
Title
Eliminating the galvanic effect for microdevices fabricated with PolyMUMPs®
Author
Syed, Abdullah ; Mu, Luye ; Shavezipur, Mohammad ; Nieva, Patricia
Author_Institution
Mech. & Mechatron. Eng., Univ. of Waterloo, Waterloo, ON
fYear
2008
fDate
15-15 Oct. 2008
Firstpage
197
Lastpage
200
Abstract
The galvanic effect may notably damage associated micro-electro-mechanical devices fabricated with processes involving electrochemical steps. This effect is commonly observed when a significant amount of gold is used to design MEMS devices that are fabricated using PolyMUMPsreg. To study and overcome the galvanic effect on these devices, three methods are proposed: (1) connecting the device to a poly0 ring; (2) increasing the device surface area and (3) grounding the device to the substrate. The three methods are compared for their effectiveness in preventing galvanic corrosion. It is observed that although all three methods can considerably restrain the galvanic effect, grounding the device to the substrate is the best solution.
Keywords
micromechanical devices; PolyMUMP; galvanic effect elimination; micro-electro-mechanical device fabrication; Corrosion; Fabrication; Galvanizing; Gold; Grounding; Hafnium; Microelectromechanical devices; Micromechanical devices; Silicon; Wet etching; HF wet etch release; MEMS corrosion; Microdevices; PolyMUMPs®; electrochemical etching; galvanic effect;
fLanguage
English
Publisher
ieee
Conference_Titel
Microsystems and Nanoelectronics Research Conference, 2008. MNRC 2008. 1st
Conference_Location
Ottawa, Ont.
Print_ISBN
978-1-4244-2920-2
Electronic_ISBN
978-1-4244-2921-9
Type
conf
DOI
10.1109/MNRC.2008.4683412
Filename
4683412
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