• DocumentCode
    3515230
  • Title

    Versatile low cost wafer level packaging enabled by powderblasting

  • Author

    Lee, Jeyull

  • Author_Institution
    Harwell Bus. Centre, Appl. Microengineering Ltd., Didcot
  • fYear
    2008
  • fDate
    1-4 Sept. 2008
  • Firstpage
    245
  • Lastpage
    252
  • Abstract
    A novel and highly cost-effective range of wafer level packaging schemes are presented for batch production across a heterogeneous spectrum of materials and applications. The enabling technology for these techniques is the development of accurate and repeatable wafer patterning processes using microabrasive powder blasting, supported by state of the art aligned wafer bonding technology. The combination of low-cost, material independent wafer-patterning, electroplating and aligned wafer bonding (eutectic, anodic, glass frit, and low temperature direct bonding) offers the benefits of wafer level packaging to low-volume, R&D, batch, and bridge-to- manufacture applications. Material and process flexibility enables implantable, CMOS, wafer- and chip-to-wafer packaging.
  • Keywords
    electroplating; flexible manufacturing systems; powder technology; wafer bonding; wafer level packaging; batch production; low cost wafer level packaging; powderblasting; wafer bonding technology; wafer patterning processes; CMOS process; CMOS technology; Costs; Glass manufacturing; Packaging; Powders; Production; Temperature; Wafer bonding; Wafer scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics System-Integration Technology Conference, 2008. ESTC 2008. 2nd
  • Conference_Location
    Greenwich
  • Print_ISBN
    978-1-4244-2813-7
  • Electronic_ISBN
    978-1-4244-2814-4
  • Type

    conf

  • DOI
    10.1109/ESTC.2008.4684357
  • Filename
    4684357