• DocumentCode
    351579
  • Title

    Effect of crystal orientation on lapping and polishing processes of natural quartz

  • Author

    Guzzo, Pedro L. ; Daniel, José ; De Mello, B.

  • Author_Institution
    Dept. de Ciencias Fisicas, Univ. Fed. de Uberlandia, Uberlandia, Brazil
  • Volume
    1
  • fYear
    1999
  • fDate
    1999
  • Firstpage
    465
  • Abstract
    Lapping and polishing processes of natural quartz are investigated in relation to crystalline orientation and applied normal stress. Weight loss measurements and surface profilometry were carried out in X-, Y-, Z- and AT-cut samples. It is shown that the relationship found between material removal rate and stress depends on specimen orientation. This behavior is discussed in relation to fracture toughness and scratch hardness anisotropy. Scanning electron microscopy (SEM) shows that microcracking is the main mechanism involved with material removal in lapping whereas plastic deformation is observed on surfaces polished with high normal stresses. Surface profiles and SEM micrographs show that roughness of lapped surfaces decreases with increasing the normal stress but an opposite behavior is observed in polished surfaces
  • Keywords
    crystal orientation; fracture toughness; hardness; materials testing; microcracks; piezoelectric materials; plastic deformation; polishing; quartz; rough surfaces; scanning electron microscopy; surface topography; surface treatment; AT-cut samples; SEM micrographs; SiO2; applied normal stress; crystal orientation; fracture toughness; lapped surfaces; lapping process; material removal rate; microcracking; natural quartz; plastic deformation; polished surfaces; polishing process; roughness; scanning electron microscopy; scratch hardness anisotropy; specimen orientation; surface profilometry; weight loss measurements; Crystalline materials; Crystallization; Lapping; Loss measurement; Rough surfaces; Scanning electron microscopy; Stress; Surface cracks; Surface roughness; Weight measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Frequency and Time Forum, 1999 and the IEEE International Frequency Control Symposium, 1999., Proceedings of the 1999 Joint Meeting of the European
  • Conference_Location
    Besancon
  • ISSN
    1075-6787
  • Print_ISBN
    0-7803-5400-1
  • Type

    conf

  • DOI
    10.1109/FREQ.1999.840807
  • Filename
    840807