DocumentCode
3516193
Title
Plane wave transmission response of selectively doped and micromachined silicon wafers under optical illumination
Author
Lockyer, D.S. ; Vardaxoglou, J.C. ; Kearney, M.J.
Author_Institution
Dept. of Electron. & Electr. Eng., Loughborough Univ., UK
fYear
1999
fDate
1999
Firstpage
169
Abstract
The optical manipulation of the transmission properties of selectively doped and micromachined silicon wafers is described. This is achieved by means of optically exciting the silicon and inducing pseudo-conducting plasma. Comparisons between theory and experiment are made and consideration is made of the lossy nature of the plasma
Keywords
elemental semiconductors; frequency selective surfaces; micromachining; microwave photonics; photoconducting switches; semiconductor plasma; silicon; Si; lossy plasma; micromachined wafers; optical excitation; optical illumination; plane wave transmission response; pseudo-conducting plasma; Apertures; Etching; Frequency selective surfaces; Lighting; Optical arrays; Passband; Plasma applications; Plasma properties; Plasma sources; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Photonics, 1999. MWP '99. International Topical Meeting on
Conference_Location
Melbourne, Vic.
Print_ISBN
0-7803-5558-X
Type
conf
DOI
10.1109/MWP.1999.819677
Filename
819677
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