VLSI process monitoring system

The authors describe the development and implementation of an in-situ continuous monitoring system for B/323, a VLSI manufacturing line. B/323 is a Class 10 facility with 132000 sq. ft. of VLF cleanroom surrounded by a Class 10 K controlled perimeter. The manufacturing process in B/323 consists of micron and submicron semiconductor technologies. These technologies require defect densities of less than one particle/wafer/process. These requirements can only be maintained by an in-situ continuous monitoring system at the point of distribution and the point of use. This monitoring system will give the controls needed to control and eliminate process contamination caused by room environment, process liquids, and gases